Published on IESL-FORTH (http://139.91.197.33)

Office Phone: (+30) 2810 39 4106
Email: lmichalas@physics.uoc.gr
Full CV: Download [1]
Publications PDF: Download [2]
Dr. Michalas Loukas
PostDoctoral Fellow

Education

  • 2009, Ph.D. Physics Department, University of Athens, Greece
  • 2004, M.Sc., Physics Department, University of Athens, Greece
  • 2002, B.Sc. Physics Department, University of Athens, Greece

Career

  • 2018 - 2019, Senior Research Fellow, Zepler Institute for Photonics and Nanoelectronics, Univ. of Southampton, UK
  • 2016 - 2018, Research Fellow, Electronics & Computer Science (ECS), Univ. of Southampton, UK
  • 2015 - 2016, Marie - Curie Fellow, IMM-CNR, Rome, Italy
  • 2011 - 2014, Research Associate, Physics Dept., University of Athens, Greece

Interests

  • AI for micro/ nano electronics
  • RF MEMS
  • Metal-Oxide Memristors
  • Semiconductor Materials and Devices
  • Microwave Microscopy
  • Science Outreach
RF MEMS Switch Design Methodology by Electromagnetic Simulations and Machine Learning
L. Michalas, K. Konstantinidis, P. Farinelli, D. P. Mandic and G. Konstantinidis
Proceedings of European Microwave Week published by IEEE, Volume:52nd European Microwave Conference (EuMC), Milan, Italy, Page:pp. 369-372, Year:2022, DOI: doi.org/10.23919/EuMC54642.2022.9924321 [3]
An electrical characterization methodology for identifying the switching mechanism in TiO2 memristive stacks
L. Michalas, S. Stathopoulos, A. Khiat, T. Prodromakis
Sci Rep, Volume:9, Page:8168, Year:2019, DOI:doi.org/10.1038/s41598-019-44607-3 [4]
Conduction mechanisms at distinct resistive levels of Pt/TiO2-x/Pt memristors
L. Michalas, S. Stathopoulos, A. Khiat, T. Prodrormakis
Appl. Phys. Lett., Volume:113, Page:143503, Year:2018, DOI:doi.org/10.1063/1.5040936 [5]
Electrical characteristics of interfacial barriers at Metal – TiO2 contacts
L. Michalas, A. Khiat, S. Stathopoulos, T. Prodromakis
J. Phys. D: Appl. Phys., Volume:51, Page:425101, Year:2018, DOI:doi.org/10.1088/1361-6463/aadbd2 [6]
Modeling and de-embedding the interferometric scanning microwave microscopy by means of dopant profile calibration
L. Michalas, F. Wang, C. Brillard, N. Chevalier, J.M Hartmann, R. Marcelli, D. Theron
Appl. Phys. Lett., Volume:107, Page:223102, Year:2015, DOI:doi.org/10.1063/1.4936761 [7]

Links
[1] http://139.91.197.33/sites/default/files/cv-en/Loukas-CV.pdf [2] http://139.91.197.33/sites/default/files/publications/Loukas-Publications.pdf [3] https:// doi.org/10.23919/EuMC54642.2022.9924321 [4] https://doi.org/10.1038/s41598-019-44607-3 [5] https://doi.org/10.1063/1.5040936 [6] https://doi.org/10.1088/1361-6463/aadbd2 [7] https://doi.org/10.1063/1.4936761 [8] http://139.91.197.33/en/research/MRG_RF_systems [9] http://139.91.197.33/en/project/aims-50 [10] http://139.91.197.33/en/project/prime